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Beilstein J. Nanotechnol. 2018, 9, 1728–1734, doi:10.3762/bjnano.9.164
Figure 1: Outline of the AFIR process. Si(100) wafers with a native layer of SiO2 were coated with Fe2O3. Ant...
Figure 2: (a) SEM image of the antidot array patterned on the film with 27 nm thickness. (b) Profile obtained...
Figure 3: XRD patterns of the as-deposited Fe2O3 film (blue curve) and the Fe3O4 film (red curve) after the t...
Figure 4: Central region of the hysteresis curves for the antidot arrays obtained from a 27 nm thick film. (a...
Figure 5: (a) Coercivity of the initial thin film and of the square (blue squares) and the hexagonal (red tri...
Figure 6: Coercivity (red squares) and normalized remanence (blue dots) as a function of the angle θ at which...
Beilstein J. Nanotechnol. 2017, 8, 434–439, doi:10.3762/bjnano.8.46
Figure 1: Scheme of the sputtering process with glancing angle deposition and rotating substrate.
Figure 2: (a) Photograph, (b) AFM images, and (c) SEM images (upper row: top view, lower row: fracture cross ...
Figure 3: (a) Diameter distribution obtained from top-view SEM images for the Au samples prepared onto Si sub...
Figure 4: Reflectance spectra of nanostructured Au samples exhibiting black color (a) and golden color (b). F...
Figure 5: (a) Photograph of two samples prepared onto MgO substrates: a continuous Au thin film prepared with...